Electron beam lithography is a versatile tool capable of making almost all kinds of patterns imaginable within nanotechnology. Moreover, tiny nanostructures can be manufactured by electron beam lithography with high reliability and accuracy, without the need for a photomask, and at a resolution of less than 10 nm. In the coming years, lithography systems must produce microchips with smaller feature sizes, while maintaining throughputs comparable to those of conventional optical lithography systems.This growth is primarily driven by The Growth of Nanotechnology in Manufacturing and Design Sector Globally and Increasing Usage of E-Beam in Various commercial applications.
Globally, a noticeable market trend is evident Adoption of State-of-the-Art E-Beam System by key Market Players
. Major Players, such as Raith GmbH (Germany), Vistec Electron Beam GmbH (Germany), JEOL Ltd. (Japan), STS-ELIONIX (United States), Crestec Inc. (Japan), NanoBeam (United Kingdom), EULITHA (Switzerland) and Advantest Corporation (Japan) etc have either set up their manufacturing facilities or are planning to start new provision in the dominated region in the upcoming years.
- The Growth of Nanotechnology in Manufacturing and Design Sector Globally
- Increasing Usage of E-Beam in Various commercial applications
- Adoption of State-of-the-Art E-Beam System by key Market Players
- E-Beam Provides Very High-Resolution Lithography
- Availability of Photo Lithography System
Need to Penetrate the Asia Pacific Market and Able to Print Complex Patterns Directly on Wafers with Flexible technique
High Manufacturing Cost and E-Beam is Very Expansive
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